| 9031.49.70 | 00 | For inspecting masks (other than photomasks) used in manufacturing semiconductor devices; for measuring surface particulate contamination on semiconductor devices | No. | Free | | 50% |
| 9031.49.90 | 00 | Other | X | 3.5% | Free (A,AU,BH,CA, CL,E,IL,J,JO, MA,MX,P,SG) | 50% |
| 9031.80.40 | 00 | Electron beam microscopes fitted with equipment specifically designed for the handling and transport of semiconductor wafers or reticles | No. | Free | | 40% |
| 9031.80.80 | | Other | | 1.7% | Free (A,AU,B,BH, C,CA,CL,E,IL,J, JO,MA,MX,P, SG) | 40% |
| 9031.80.80 | 60 | For testing electrical characteristics | X | | | |
| 9031.80.80 | 70 | Other | X | | | |
| 9031.80.80 | 85 | Other | X | | | |
| 9031.90.20 | 00 | Of profile projectors | X | 2.5% | Free (A,AU,BH,CA, CL,E,IL,J,JO, MA,MX,P,SG) | 45% |
| 9031.90.58 | 00 | Other | X | 3.5% | Free (A,AU,BH,CA, CL,E,IL,J,JO, MA,MX,P,SG) | 50% |
| 9031.90.90 | | Other | | 1.7% | Free (A,AU,B,BH, C,CA,CL,E,IL,J, JO,MA,MX,P, SG) | 40% |
| 9031.90.90 | 30 | Of machines for balancing mechanical parts | X | | | |
| 9031.90.90 | 60 | Of test benches | X | | | |
| 9031.90.90 | 95 | Other | X | | | |
| 9032.10.00 | | Thermostats | | 1.7% | Free (A,AU,B,BH, C,CA,CL,E,IL,J, JO,MA,MX,P, SG) | 40% |
| 9032.10.00 | 60 | Other | No. | | | |
| 9032.10.00 | 90 | Other | No. | | | |
| 9032.20.00 | 00 | Manostats | No. | 1.7% | Free (A,AU,B,BH, C,CA,CL,E,IL,J, JO,MA,MX,P, SG) | 35% |
| 9032.81.00 | 80 | Other | No. | | | |
| 9032.89.40 | 00 | Other | X | 1.7% | Free (A,AU,BH,C, CA,CL,E,IL,J,JO, MA,MX,P,SG) | 35% |
| 9032.89.60 | | Other | | 1.7% | Free (A,AU,B,BH, C,CA,CL,E,IL,J, JO,MA,MX,P, SG) | 40% |
| 9032.89.60 | 15 | Complete systems | No. | | | |
| 9032.89.60 | 25 | Other | X | | | |
| 9032.89.60 | 30 | Complete systems | No. | | | |
| 9032.89.60 | 85 | Other | X | | | |
| 9032.89.60 | 40 | Temperature control instruments | No. | | | |
